ASML-SA (as OEM and Tool Applications expert) with help from SVTC (as process integrator in their advanced lab equipped with ASML tools) had the first responsibility to setup first phase of tests to provide alignment solution with proof of concept.

ASML's deep ultraviolet (DUV) lithography systems dive deep into the UV spectrum to print the tiny features that form the basis of the microchip.

2023年12月1日 · • 💡 ASML光刻机经历了多个技术升级，从Aligner到Stepper再到Scanner，每一次升级都面临着更高的技术难度。 • 💡 High-NA EUV光刻机是ASML的最新一代产品，但其推出面临着诸多挑战，包括材料、精度、光路设计等方面的问题。

The TWINSCAN XT:1460K 193 nm step-and-scan system is a high-productivity, dual-stage ArF lithography tool designed for volume 300 mm wafer production at 65 nm resolution. The TWINSCAN XT:1460K contains a variable 0.93 NA 193 …

4 天之前 · The ASML 5500 stepper is a 248nm (KrF) DUV stepper for imaging dense features down to below 200nm and isolated line structures down to below 150nm (with effort). 300nm+ features are relatively "easy" to resolve.

2024年8月9日 · 什么是stepper和scanner？ sepper，全名步进投影式光刻机。 Stepper 每次曝光晶圆上的一小块区域，即一个shot，然后晶圆在曝光后移动到下一个区域，重复此过程，逐步曝光整个晶圆。 scanner,全名步进扫描投影式光刻机。 为什么Scanner更快？ 这要从其工作原理来入手。

ASML’s Special Applications Business unit jointly with SVTC and Miradia came up with a simple but elegant lithographic technique that can be applied on ASML’s advanced litho tools as solution to this challenge.

The ASML PAS 5500/300C DUV Wafer Stepper is a late-1990’s tool using light from a 10W Krypton-Fluoride (KrF) excimer laser source. It has a 4X reduction lens with variable Numerical Aperture (N.A.) and a programmable light source shaping system called AERIAL.

2024年10月23日 · On the ASML, you can now keep the Focus constant according to the central Focus value from your Coarse FEM, and do only an Energy serpentine. Analyze to measure actual feature size, according to your process tolerance.

In order to align a reticle to the stepper, the reticle must have fiducial marks at given locations near the edge of the mask. The ASML fiducial marks are shown on the following pages.