Extreme ultraviolet lithography (EUVL, also known simply as EUV) is a technology used in the semiconductor industry for manufacturing integrated circuits (ICs). It is a type of photolithography that uses 13.5 nm extreme ultraviolet (EUV) light from a laser-pulsed tin (Sn) plasma to create intricate patterns on semiconductor substrates.

EUV Light Source: A droplet generator instrument must dispense molten tin continuously and reliably. The droplet generator is the ‘heartbeat of EUV’ as droplet timing triggers a laser pulse to create EUV light.

2020年9月25日 · EUV Source: Architecture Principles of EUV Generation Challenges and Practicalities EUV light is generated in the source and guided through

EUV power recorded 100W average (105W stabilized, 95% duty) with 5% conversion efficiency for 5hours operation in September 2016. iency is realized with several key engineering ef

2022年9月1日 · In this paper, we describe the performance characteristics of the laser system, droplet generator and mirror collector for different EUV sources, and also the new development results.

o What is the cause of the ion energy distribution? 1. Understand exploding tin microdroplets. o What determines deformation and fragmentation? 2. Key insights to enable source predictive modeling. o What emits that EUV light? 3. Push the fundamental limits of the conversion efficiency. o What sets the fundamental limit? 4.

2025年1月24日 · Tsinghua University: Leading the SSMB-EUV project to establish a large-scale light source for future photolithography machines. In January 2024, Harbin’s team collaborated with Shanghai researchers to improve EUV light control and focusing techniques.

2021年10月5日 · Key to an EUV system is the source. Based on a laser-produced-plasma (LPP) technology, the EUV source consists of several parts, including a carbon dioxide (CO²) laser. The laser, which provides power for the source, is located under the fab floor in the sub-fab.

Companies that are developing the EUVL (Extreme Ultra Violet Lithography) infrastructure need a reliable source of EUV light to test their products, such as mirrors, collection optics, and photoresist. In addition, there is a need for a light source …

Energetiq’s EUV light sources are the industry standard source for EUV infrastructure R&D, inspection, resist development, outgassing, mirror testing, and more.