DUV lithography systems | Products - ASML
ASML's deep ultraviolet (DUV) lithography systems dive deep into the UV spectrum to print the tiny features that form the basis of the microchip.
ASML光刻机是怎样一步步走上“绝路”的？ - 虎嗅网
2023年12月1日 · • 💡 ASML光刻机经历了多个技术升级，从Aligner到Stepper再到Scanner，每一次升级都面临着更高的技术难度。 • 💡 High-NA EUV光刻机是ASML的最新一代产品，但其推出面临着诸多挑战，包括材料、精度、光路设 …
TWINSCAN XT:1460K - DUV lithography machines
The TWINSCAN XT:1460K 193 nm step-and-scan system is a high-productivity, dual-stage ArF lithography tool designed for volume 300 mm wafer production at 65 nm resolution. The TWINSCAN XT:1460K contains a variable 0.93 NA 193 …
Stepper 3 (ASML DUV) - UCSB Nanofab Wiki - UC Santa Barbara
- General Capabilities/Overview
The ASML 5500 stepper is a 248nm (KrF) DUV stepper for imaging dense features down to below 200nm and isolated line structures down to below 150nm (with effort). 300nm+ features are relatively "easy" to resolve. Layer-to-layer overlay accuracy is better than 30nm. The system is … - Photoresists Available
See PhotoLith. Recipesfor full process info & links to PR datasheets. 1. UV210-0.3 - Positive: 300nm nominal thickness 2. UV6-0.8 - Positive: 800nm nominal thickness 3. UV26-2.5 - Positive: 2.5um nominal thickness 4. UVN2300-0.5 - Negative: 500nm nominal thickness 1. DUV42P-6/D…
- General Capabilities/Overview
Scanner为什么那么快？ - 哔哩哔哩
2024年8月9日 · 什么是stepper和scanner？ sepper，全名步进投影式光刻机。 Stepper 每次曝光晶圆上的一小块区域，即一个shot，然后晶圆在曝光后移动到下一个区域，重复此过程，逐步 …
- 其他用户还问了以下问题
Novel lithography technique using an ASML stepper/scanner for …
ASML’s Special Applications Business unit jointly with SVTC and Miradia came up with a simple but elegant lithographic technique that can be applied on ASML’s advanced litho tools as …
The ASML PAS 5500/300C DUV Wafer Stepper is a late-1990’s tool using light from a 10W Krypton-Fluoride (KrF) excimer laser source. It has a 4X reduction lens with variable …
ASML Stepper 3 Standard Operating Procedure - UC …
2024年10月23日 · On the ASML, you can now keep the Focus constant according to the central Focus value from your Coarse FEM, and do only an Energy serpentine. Analyze to measure actual feature size, according to your …
In order to align a reticle to the stepper, the reticle must have fiducial marks at given locations near the edge of the mask. The ASML fiducial marks are shown on the following pages.
