We are producing mirrors and frames for High-NA EUV optics at full speed. Build up of system integration tools is progressing. EUV roadmap extensions are visible. This work has received …

EUV program at ZEISS: Continuously improving resolution. The ZEISS Starlith®3400 optics delivers excellent imaging... ...for the ASML NXE:3400B scanner. Displaying the information of …

Main focus is the thermal architecture of EUV- and DUV-systems. The 7 nm node is a very big challenge to the thermal stability of the EUV-optics. The POB-mirrors projects the reticle …

Carl Zeiss SMT GmbH, Winfried Kaiser EUVL Symposium 2015 Maastricht October 7th, 2015 12 The 1st ZEISS EUV optics system: a small field system for the Micro Exposure Tool (“MET”)

Carl Zeiss SMT AG Page 22 • alpha demo tool program is progressing: • the source collector module has been shipped to ASML • the illuminator is in the assembly phase • all …

Delivery of more than 140 EUV systems with 0.33 NA at high and robust performance. More to come due to strong market pull. We are producing mirrors and frames for High-NA EUV optics …

• three Illumination systems shipped to ASML • flexible fly’s eye mirror allows high efficiency in all settings Carl Zeiss SMT GmbH 3. October 2012 22

An EUV infrastructure has been set up at Zeiss PPT: Optics for 3100 (27 nm) delivered HVM: Optics for 3300 (22 – 16 nm) at the start of prototyping ¾Optical design fixed and mechanical …

2016年11月3日 · ASML buys 24.9% of ZEISS subsidiary Carl Zeiss SMT for EUR 1 billion in cash; Start of development of entirely new High NA optical system for the future generation of …

2019年3月26日 · To enable cost-effective shrink of future devices, a new High-NA EUV platform is being developed in a joint collaboration between ASML and Carl Zeiss SMT. The High-NA …