To curb China's domestic advancements in semiconductor technology, particularly in photolithography, the US Department of Commerce (DOC) has recently intensified its efforts against Chinese companies.

Extreme-ultraviolet (EUV) lithography at 13.5 nm is expected to be introduced in high-volume semiconductor chip ... source and zone-plate optics to focus the radiation. The concept of the laser ...

The EUV lithography market is witnessing rapid advancements as it plays a crucial role in semiconductor manufacturing. This cutting-edge technology enables the production of smaller and more ...