Chinese chipmaking stocks soared as reports of domestic advancements in extreme ultraviolet (EUV) lithography technology emerged, signaling potential independence from U.S. sanctions.

The Harbin Institute of Technology scientists claimed to have developed a compact and stable source of EUV light that could then be used to manufacture advanced, sub-7nm chips. Currently ...

最后，对于中芯国际面临的技术瓶颈，王国辉承认，中国目前确实无法获得ASML的EUV光刻机，而这些设备是在尖端节点上生产芯片所需的。 然而 ...

Extreme Ultraviolet (EUV) lithography is a critical technology for manufacturing semiconductor chips smaller than 7 nanometers. For years, Dutch company ASML has maintained a global monopoly on ...

New approaches in the development of extreme ultraviolet (EUV) lithography are being pioneered by Chinese scientists, paving the way for the mass production of advanced semiconductor chips as ...

而王国辉突然表态看好中芯国际，认为中国国内市场庞大且具备一定的“隔离效应”，中芯国际缺的是一台国产EUV光刻机，一旦有公司成功研发出EUV光刻设备，那么芯片战就会结束。 这背后是看到了国产EUV光刻机技术突破越来越近，中芯国际未来或有望实现跨越 ...

而王国辉突然表态看好中芯国际，认为中国国内市场庞大且具备一定的“隔离效应”，中芯国际缺的是一台国产EUV光刻机，一旦有公司成功研发出EUV ...

EUV光刻机的波长为13.5nm，而100KeV电子束的波长只有0.004nm，波长短使其在分辨率方面与EUV相比有绝对的优势，也使得电子束能够实现EUV光刻都实现不了 ...

光刻机作为芯片生产的关键设备，被视为国家战略重器之一。它分为EUV和DUV两种类型。EUV光刻机的制造技术要求尤为严格，这属于我国技术领域的短板。 近年来，我国科研院所和高校持续开展科技攻关，逐步攻克制造技术领域的难题。 EUV光刻机技术难度高 ...

EUV多层膜元件是EUV光学系统的核心光学元件，通过周期性膜层结构设计可以在特定波长和入射角度条件下获得尽可能高的反射 ...