Extreme-ultraviolet (EUV) lithography at 13.5 nm is expected to be introduced in high-volume semiconductor chip production over the next three years. Research is now underway to investigate sub-10 ...

suggesting that the right choice of nanomaterials can lead to better device functionalities. Additionally, advancements in nanopatterning techniques, such as UV-curing nanoimprint lithography ...

By controlling the orientation and stacking of block copolymer domains, intricate 3D architectures can be created, offering new opportunities for the fabrication of advanced nanomaterials and devices.