By way of example, TSMC's N3E node as used in the latest Apple chips has gate pitch of at minimum 45 nm and a metal pitch of ...

Now, some researchers hope to generate more powerful EUV beams with a particle accelerator that propels electrons to nearly ...

Yet unlike software, where industry leadership can shift in months, success in lithography is a slow-moving race measured in ...

China is set to mass-produce complex EUV systems as early as 2026. However, this does not seem particularly realistic.

Current lithography machines use photographic techniques to create minute electrical circuits smaller than 1/100th of a human hair on a silicon wafer. They use a mask which contains the blueprint of ...

Peking University has published its findings on a wafer-scale 2D GAAFET in Nature, pointing a new path into the Angstrom era ...

The leading semiconductor equipment maker is still a great long-term investment.

is dedicated to the development and adoption of EUV lithography systems for advanced chip manufacturing. This cutting-edge ...

The Birmingham spin-out's new CEO will drive the adoption of an innovative platform technology to print the most intricate layers on silicon chips.