Inverse lithography technology (ILT) holds much promise with flexible cost functions to deliver optimal mask corrections in these overlapping regions. The final trend to consider is the rise of ...

Recent research in this field has explored various innovative methods to enhance the precision and efficiency of lithography processes, particularly through the use of machine learning ...

Mask process correction (MPC) solutions correct the shapes output by optical proximity correction (OPC) or inverse lithography technology (ILT), so that what OPC/ILT assumed would be the manufactured ...