the removal of photoresist is a nonlinear function of the applied UV energy dose. We have shown that this nonlinearity can be exploited to break the diffraction limit on feature size in single ...
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China developing critical chipmaking supply chains — photoresist ecosystem emerges for ArF and KrF lasersHigh-purity photoresists are essential for making chips on advanced production nodes. As China strides to build a self-sufficient semiconductor industry, it has to develop not only sophisticated ...
Non-Chemically Amplified ArF Dry Photoresists 4) By g- and i-line: g-line Photoresists, i-line Photoresists, Negative Photoresists For g- and i-line The Leading Region in the Photoresist ...
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