最后，对于中芯国际面临的技术瓶颈，王国辉承认，中国目前确实无法获得ASML的EUV光刻机，而这些设备是在尖端节点上生产芯片所需的。 然而 ...

最后，对于中芯国际面临的技术瓶颈，王国辉承认，中国目前确实无法获得ASML的EUV光刻机，而这些设备是在尖端节点上生产芯片所需的。 然而 ...

Extreme-ultraviolet (EUV) lithography at 13.5 nm is expected to be introduced in high-volume semiconductor chip production over the next three years. Research is now underway to investigate sub-10 ...

哈尔滨工业大学（哈工大）近日宣布，已成功研发出13.5奈米极紫外光（EUV）光源技术，打破此领域由美国企业垄断的局面，也为大陆的国产EUV曝光机 ...

而王国辉突然表态看好中芯国际，认为中国国内市场庞大且具备一定的“隔离效应”，中芯国际缺的是一台国产EUV光刻机，一旦有公司成功研发出EUV ...

In the extreme ultraviolet (EUV; 5–100 nm) and soft-X-ray (2–5 nm) regions of the spectrum, a new and exciting set of applications for science and nanotechnology awaits. Currently, only a few ...

New approaches in the development of extreme ultraviolet (EUV) lithography are being pioneered by Chinese scientists, paving the way for the mass production of advanced semiconductor chips as ...

EUV tools with a 11.2nm wavelength The Russian ... Although 11.2 nm still falls within the extreme ultraviolet spectrum, this shift is not a minor adjustment. It means that all optical elements ...