Extreme-ultraviolet (EUV) lithography at 13.5 nm is expected to be introduced in high-volume semiconductor chip production over the next three years. Research is now underway to investigate sub-10 ...
Hosted on MSN1mon
Russia plans EUV chipmaking tools that it says will be cheaper and easier to build than ASML's — country outlines new roadmap to smaller chipsEUV tools with a 11.2nm wavelength The Russian ... Although 11.2 nm still falls within the extreme ultraviolet spectrum, this shift is not a minor adjustment. It means that all optical elements ...
9月，佳能交付了一种技术的首个商业版本，该技术有朝一日可能颠覆最先进硅芯片的制造方式。这种技术被称为纳米压印光刻技术（NIL，nanoimprint lithography），它能够绘制出小至14纳米的电路特征——使逻辑芯片达到与英特尔、超微半导体（AMD）和英伟达现正大量生产的处理器相当的水平。 纳米压印光刻系统具有的优势可能对当今主导先进芯片制造、价值1.5亿美元的极紫外（EUV，https: ...
最后，对于中芯国际面临的技术瓶颈，王国辉承认，中国目前确实无法获得ASML的EUV光刻机，而这些设备是在尖端节点上生产芯片所需的。 然而 ...
最后，对于中芯国际面临的技术瓶颈，王国辉承认，中国目前确实无法获得ASML的EUV光刻机，而这些设备是在尖端节点上生产芯片所需的。 然而 ...
Some results have been hidden because they may be inaccessible to you
Show inaccessible results
Feedback