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Rapidus to reportedly install 10 EUV chipmaking tools at its fab in JapanRapidus plans to install as many as 10 EUV lithography tools into its upcoming fabs in Japan, reports TrendForce, citing ...
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Lam Research Corporation (Nasdaq: LRCX) today announced that Aether®, its innovative dry photoresist technology, has been ...
To do so, Intel has been experimenting for quite a while when it first obtained ASML's Twinscan EXE:5000, which was the industry's first EUV scanner with a 0.55 numerical aperture. Today ...
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Russia plans EUV chipmaking tools that it says will be cheaper and easier to build than ASML's — country outlines new roadmap to smaller chipsRussia has unveiled a roadmap to develop its own lithography machines, aiming to create less costly and complex equipment than ASML's systems, according to CNews. These machines will use lasers ...
Current EUV pellicles struggle to withstand the extreme conditions of high-power EUV scanners, leading to performance issues. The potential of carbon nanotubes: CNT-based EUV pellicles offer ...
Lam Research Establishes 28nm Pitch in High-Resolution Patterning Through Dry Photoresist Technology
At imec, Lam's 28nm pitch dry resist processes are paired with a low NA EUV scanner, and extendible to a high NA EUV scanner. They enhance EUV sensitivity and the resolution of each wafer pass ...
最后，对于中芯国际面临的技术瓶颈，王国辉承认，中国目前确实无法获得ASML的EUV光刻机，而这些设备是在尖端节点上生产芯片所需的。 然而 ...
This is because all matter, including air, absorbs EUV radiation. For scanner manufacturers, this has two major consequences. First, it means that all the optical elements responsible for the ...
快科技1月6日消息，美国劳伦斯利弗莫尔国家实验室（LLNL）正在研究一种效率比传统CO2 EUV激光器高10倍的激光器，这将为下一代EUV光刻技术发展奠定 ...
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