Current EUV pellicles struggle to withstand the extreme conditions of high-power EUV scanners, leading to performance issues. The potential of carbon nanotubes: CNT-based EUV pellicles offer ...

Rapidus plans to install as many as 10 EUV lithography tools into its upcoming fabs in Japan, reports TrendForce, citing ...

Lam Research Corporation (Nasdaq: LRCX) today announced that Aether®, its innovative dry photoresist technology, has been ...

At imec, Lam's 28nm pitch dry resist processes are paired with a low NA EUV scanner, and extendible to a high NA EUV scanner. They enhance EUV sensitivity and the resolution of each wafer pass ...

At imec, Lam's 28nm pitch dry resist processes are paired with a low NA EUV scanner, and extendible to a high NA EUV scanner. They enhance EUV sensitivity and the resolution of each wafer pass — ...

This advancement drives down costs and enhances scanner productivity in the manufacturing ... A key enabler of this scaling is industry-wide adoption of EUV lithography. Lam's dry photoresist ...