ASML’s strong moat is challenged by potential competitors and geopolitical risks. Read why ASML stock’s premium valuation may ...

EUV lithography tools consume such vast amounts of power because they rely on high-energy laser pulses to evaporate tiny tin droplets (at 500,000ºC) to form a plasma that emits 13.5-nanometer light.

2023年9月，许多人为“光刻厂”的构想喜大普奔。据说中国可以另辟蹊径，不是用一台台的光刻机，而是用加速器做一个巨大的光源，可以供28 nm、14 nm、7 nm、5 ...

Hertz et al. 4 have developed a soft-X-ray/EUV microscope in the water window that achieves sub-visible-light resolution. The microscope consists of a laser-plasma source and zone-plate optics to ...

For years, Dutch company ASML has maintained a global monopoly on EUV machines using the laser-produced plasma (LPP) method. However, since 2019, US-led sanctions have barred ASML from selling ...

This uses a CO 2 laser of wavelength 10.6 μm to convert tin droplets into a plasma, which then emits bursts of broadband EUV radiation. According to Cymer, this set-up has twice the conversion ...

Efforts involve the use of solar hard and soft X-ray, microwave, optical, and extreme ultra-violet (EUV) data.