GM is developing a new generation for the all-electric Chevy Bolt EV. Now, it looks as though an early next-gen Bolt EV prototype has been spotted in the wild.

9月，佳能交付了一种技术的首个商业版本，该技术有朝一日可能颠覆最先进硅芯片的制造方式。这种技术被称为纳米压印光刻技术（NIL，nanoimprint lithography），它能够绘制出小至14纳米的电路特征——使逻辑芯片达到与英特尔、超微半导体（AMD）和英伟达现正 ...

最后，对于中芯国际面临的技术瓶颈，王国辉承认，中国目前确实无法获得 ASML 的 EUV 光刻机，而这些设备是在尖端节点上生产芯片所需的。然而 ...

EUV光刻机的波长为13.5nm，而100KeV电子束的波长只有0.004nm，波长短使其在分辨率方面与EUV相比有绝对的优势，也使得电子束能够实现EUV光刻都实现不了 ...

A breakthrough in EUV light generation has come from adopting the laser-induced discharge plasma (LDP) method, an innovative approach that avoids reliance on LPP technology. The LDP process ...

A breakthrough introduced by Lam in 2020, dry resist extends the resolution, productivity, and yield of Extreme Ultraviolet (EUV) lithography, a pivotal technology used in the production of ...

A pilot line will begin at Rapidus’ IIM-1 in April 2025. A single-wafer process will be introduced for all manufacturing ...

and yield of Extreme Ultraviolet (EUV) lithography, a pivotal technology used in the production of next-generation semiconductor devices. Lam's dry resist approach overcomes the biggest challenges ...

ASML will deliver the first high-NA-EUV chip production machine for mass production in the coming months. This slightly ...