Yet unlike software, where industry leadership can shift in a matter of months, success in lithography is a slow-moving race ...

At present, about 600 ICs can be simultaneously produced in parallel on a single wafer, a disk measuring 300 mm in diameter. Interestingly, DUV lithography at a wavelength of 193 nm has dominated ...

Now, some researchers hope to generate more powerful EUV beams with a particle accelerator that propels electrons to nearly ...

Multiple e-beam maskless lithography uses over 10,000 electron beams working in parallel to directly write circuit patterns on a wafer, eliminating the need for the costly photomasks used in current ...

The aptly monikered Redditor, AVX512-VNNI, says the wafer, which appears to be fully intact, was found discarded at TSMC's ...

The EUV lithography sector is on the brink of significant expansion, primarily fueled by the relentless drive for the ...

VNNI, claims to have found the wafer near TSMC's Fab 16 factory in Nanjing, China. While not cutting-edge, that ...

A technical paper titled “Make the impossible possible: use variable-shaped beam mask writers and curvilinear full-chip inverse lithography technology for 193i contacts/vias with mask-wafer ...

Some dumpster diver in China lucked out when they went scavenging inside TSMC’s garbage recently and found a literal Chip ...

Intel says that its two High-NA EUV lithography machines are in use and are an improvement over the OG EUV equipment.

to transfer them to a semiconductor wafer. In October last year, the Japanese multinational revealed it was commercializing a ...

ASML and Imec this week established a five-year partnership designed to enable Imec's researchers and developers access to ...