Photolithography at a wavelength of 193 nm in the deep UV with water immersion lenses can now produce microelectronics containing features with a half-pitch as small as 40 nm. The big question is ...

Extreme ultraviolet lithography extends photolithography to much shorter wavelengths and is a cost-effective method of producing more-advanced integrated circuits. Although some infrastructure ...

This pattern can then guide further processes, such as etching or doping, to create the final microstructures. Photolithography offers high precision, repeatability, and the ability to fabricate ...

This array was used for the first time in a deep ultraviolet (DUV) maskless photolithography system. Photolithography is ...

The ability to create intricate, nano-scale patterns is at the heart of nanotechnology, and lithography techniques are the tools that make this possible. From photolithography to FIB, each technique ...

This enhanced efficiency UVC microLED has showcased the viability of a lowered cost maskless photolithography through the provision of adequate light output power density, enabling exposure of ...