Extreme-ultraviolet (EUV) lithography at 13.5 nm is expected to be introduced in high-volume semiconductor chip production over the next three years. Research is now underway to investigate sub-10 ...

offering new opportunities for the fabrication of advanced nanomaterials and devices. Another promising direction is the integration of block copolymer lithography with other nanofabrication ...

Extreme ultraviolet (EUV) lithography is the next step in this trend. It uses radiation of wavelength 13.5 nm, thereby offering significant potential to extend the resolution of photolithography ...

Delft, The Netherlands / Hsinchu, Taiwan -- Ocotober 13, 2008 -- MAPPER Lithography and Taiwan Semiconductor Manufacturing Company (TSMC) signed an agreement, according to which MAPPER will ship its ...

One of the most complex parts of this process is lithography: the step in which shapes are drawn onto a silicon wafer. There are several ways to do this, all of them rather complicated ...

The processing has been developed and demonstrated with an interferometric lithography tool. Ongoing work focuses on adapting this to projection tools though the use of new mask technologies.

Micro and sub-micro features with a range of aspect ratio were prepared by lithography. Atomic force, confocal optical, and scanning electron microscopy were used for characterization. The flexible ...

Either one or both phases can be nanomaterials. Typically ... Nanocomposites are often prepared by chemically oriented synthetic methods: Soft lithography, soft lithography, lamination, spin-coating ...

"Using nanomaterials as a response method has emerged as a promising sustainable approach," says lead author Huifang Bi, a Ph.D. candidate in the Department of Building, Civil and Environmental ...