2023年9月，许多人为“光刻厂”的构想喜大普奔。据说中国可以另辟蹊径，不是用一台台的光刻机，而是用加速器做一个巨大的光源，可以供28 nm、14 nm、7 nm、5 ...
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China's SMEE files patent for an EUV chipmaking tool — tool aims to break the shackles of ASML export restrictionsBased on the SCMP's description, SMEE is attempting to patent the key set of components of an EUV tool: a laser-produced ...
哈尔滨工业大学发布消息，EUV光刻机的光源技术取得了重大突破——“放电等离子体极紫外光刻光源”项目荣获了黑龙江省高校和科研院所职工科技创新成果转化大赛一等奖。 早在2023年，哈尔滨工业大学航天学院某研究团队研发的"放电等离子体极紫外光刻光源"项目脱颖而出。
For years, Dutch company ASML has maintained a global monopoly on EUV machines using the laser-produced plasma (LPP) method. However, since 2019, US-led sanctions have barred ASML from selling ...
New approaches in the development of extreme ultraviolet (EUV) lithography are being pioneered by Chinese scientists, paving the way for the mass production of advanced semiconductor chips as ...
在电力消耗方面，FEL光源也要远低于EUV-LPP光源。 不过，这项技术也与前文提到的激光器类似，解决的是EUV光源的问题。 值得注意的是，EUV-FEL还可 ...
Extreme-ultraviolet (EUV) lithography at 13.5 nm is expected to be introduced in high-volume semiconductor chip production over the next three years. Research is now underway to investigate sub-10 ...
近期，哈尔滨工业大学（哈工大）在高端科技领域取得了显著进展，其研发的“放电等离子体极紫外光刻光源”项目荣获黑龙江省高校和科研院所职工科技创新成果转化大赛一等奖。这一令人瞩目的成果不仅展示了哈工大的雄厚研究能力，也为中国半导体行业的发展增添了新的动力。
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成本可降低数倍！EUV光源的替代方案来了！目前的EUV光刻机系统当中的EUV光源，被称为激光等离子体EUV光源（EUV-LPP），是通过30千瓦功率的二氧化碳激光器轰击以每秒50000滴的速度从喷嘴内喷 ...
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