A technical paper titled “Make the impossible possible: use variable-shaped beam mask writers and curvilinear full-chip inverse lithography technology for 193i contacts/vias with mask-wafer ...

With refreshable devices like spatial light modulators, CGH is able to assist many fields of investigation, including three-dimensional (3D) display, holographic lithography, optical trapping ...

Synopsys’ Gandharv Bhatara notes that successfully deploying high-NA EUV will rely on computational lithography to provide accurate modeling of aberrations, compact 3D mask modeling, and expand ...