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Lam Research, a FORTUNE 500 company, is a global provider of wafer fabrication equipment and services to the semiconductor ...

Lam Research Corporation (Nasdaq: LRCX) today announced that Aether®, its innovative dry photoresist technology, has been ...

ASML faces cyclical pressures but remains strong in EUV lithography. See why ASML stock is a buy with 12% upside and ...

At imec, Lam's 28nm pitch dry resist processes are paired with a low NA EUV scanner, and extendible to a high NA EUV scanner. They enhance EUV sensitivity and the resolution of each wafer pass ...

At imec, Lam's 28nm pitch dry resist processes are paired with a low NA EUV scanner, and extendible to a high NA EUV scanner. They enhance EUV sensitivity and the resolution of each wafer pass — ...

Imec presents patterned structures obtained after exposure with the 0.55NA EUV scanner in the joint ASML-imec High NA EUV Lithography Lab in Veldhoven, the Netherlands. ... This week, at the Small ...

Twenty-year-old Brandon Robinson of Damariscotta was driving a 2021 Chevrolet Bolt EUV westbound when he lost control and the vehicle crossed the center line and off the left side of the road, the ...

Carbon nanotubes present a game-changing solution for preventing defects in EUV lithography, supporting the semiconductor ...

Current EUV pellicles struggle to withstand the extreme conditions of high-power EUV scanners, leading to performance issues. The potential of carbon nanotubes: CNT-based EUV pellicles offer ...