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Carbon nanotubes present a game-changing solution for preventing defects in EUV lithography, supporting the semiconductor ...

Lam Research Corporation (Nasdaq: LRCX) today announced that Aether®, its innovative dry photoresist technology, has been ...

Current EUV pellicles struggle to withstand the extreme conditions of high-power EUV scanners, leading to performance issues. The potential of carbon nanotubes: CNT-based EUV pellicles offer ...

ASML faces cyclical pressures but remains strong in EUV lithography. See why ASML stock is a buy with 12% upside and ...

At imec, Lam's 28nm pitch dry resist processes are paired with a low NA EUV scanner, and extendible to a high NA EUV scanner. They enhance EUV sensitivity and the resolution of each wafer pass ...

During the ceremony celebrating Chevrolet’s 100 years of operations in Brazil, General Motors officially showed the upcoming 2026 Chevy Spark EUV in the South American country. The automaker’s ...

At imec, Lam's 28nm pitch dry resist processes are paired with a low NA EUV scanner, and extendible to a high NA EUV scanner. They enhance EUV sensitivity and the resolution of each wafer pass — ...