Extreme-ultraviolet (EUV) lithography at 13.5 nm is expected to be introduced in high-volume semiconductor chip production over the next three years. Research is now underway to investigate sub-10 ...

1). Figure 1: Since the mid-1980s, the wavelength of light used in lithography systems has reduced by almost half from 365 nm to 193 nm. Extreme ultraviolet (EUV) lithography is the next step in ...

This advancement could pave the way for a new generation of 'beyond EUV' lithography systems that produce chips quicker and with less power. Of course, implementing BAT technologies into ...

This wavelength will be incompatible with existing EUV infrastructure and require Russia to develop its own lithography ecosystem, which will likely take years, if not a decade or more.

SPIE Advanced Lithography + Patterning is the leading global lithography event. Attend the meeting for optical lithography, metrology, or EUV. Hear the latest advancements where leaders come to solve ...