One of the chip industry giants just posted financial results that helped assuage the fears of many when it comes to AI ...

Extreme-ultraviolet (EUV) lithography at 13.5 nm is expected to be introduced in high-volume semiconductor chip production over the next three years. Research is now underway to investigate sub-10 ...

This enables the EUV lithography era of today, which is likely to continue for the foreseeable future. Initially, EUV became ...

Canon made quite a splash last year when it introduced its first nanoimprint lithography (NIL) machine that can be used to ...

1). Figure 1: Since the mid-1980s, the wavelength of light used in lithography systems has reduced by almost half from 365 nm to 193 nm. Extreme ultraviolet (EUV) lithography is the next step in ...

A pilot line will begin at Rapidus’ IIM-1 in April 2025. A single-wafer process will be introduced for all manufacturing ...

A new technical paper titled “Sensitivity and contrast of indium nitrate hydrate resist evaluated by low-energy electron beam ...

YOKOHAMA—After a decade of development, Canon Inc. began selling lithography equipment for semiconductor production, hoping to reclaim a share in the market. The equipment is used to print fine ...

Indeed, researchers from Japan have developed technology that makes EUV lithography simpler and more cost-effective. That could bring companies such as Nikon and Canon, which serve the more ...