来自MSN1 个月
China developing critical chipmaking supply chains — photoresist ecosystem emerges for ...
including broadband UV (300–450nm), g-line (436nm), i-line (365nm), KrF (248nm), ArF (193nm), EUV (13.5nm), and electron beam types. KrF, ArF, and EUV photoresists are the purest and the most ...
Yahoo Finance29 天
Lam Research Establishes 28nm Pitch in High-Resolution Patterning Through Dry Photoresist ...
FREMONT, Calif., Jan. 14, 2025 /PRNewswire/ -- Lam Research Corporation (Nasdaq: LRCX) today announced that its innovative dry photoresist (dry resist) technology has been qualified for direct ...
Morningstar13 天
Breakthrough EUV Dry Photoresist Technology from Lam Research Adopted by Leading Memory ...
FREMONT, Calif., Jan. 29, 2025 /PRNewswire/ -- Lam Research Corporation (Nasdaq: LRCX) today announced that Aether®, its innovative dry photoresist technology, has been selected by a leading ...