Extreme-ultraviolet (EUV) lithography at 13.5 nm is expected to be introduced in high-volume semiconductor chip production over the next three years. Research is now underway to investigate sub-10 ...

Extreme ultraviolet (EUV) lithography is the next step in this trend. It uses radiation of wavelength 13.5 nm, thereby offering significant potential to extend the resolution of photolithography ...

The ability to create intricate, nano-scale patterns is at the heart of nanotechnology, and lithography techniques are the tools that make this possible. From photolithography to FIB, each technique ...