ILSim is a compact, multi-beam interference lithography simulator. ILSim is based on full vector interference theory, which allows for application at extremely high NA values, such as those projected ...

The processing has been developed and demonstrated with an interferometric lithography tool. Ongoing work focuses on adapting this to projection tools though the use of new mask technologies.

Extreme ultraviolet lithography extends photolithography ... which reflect light through interlayer interference. Such coatings perform particularly well with 13.5 nm light. Even with these ...

It has high power laser interference lithography systems, coherent beam diagnostics, multi-function SPM systems, a dedicated nano-manipulation and lithography SPM, an environmental scanning electron ...