ILSim is a compact, multi-beam interference lithography simulator. ILSim is based on full vector interference theory, which allows for application at extremely high NA values, such as those projected ...

Working at i-line (λ=364nm), with standard novolak resists, we have demonstrated features as small as 50 nm. The processing has been developed and demonstrated with an interferometric lithography tool ...

Extreme ultraviolet lithography extends photolithography ... which reflect light through interlayer interference. Such coatings perform particularly well with 13.5 nm light. Even with these ...

OKI achieves three-dimensional (3D) integration of thin-film analogue ICs using Crystal Film Bonding (CFB) technology.