Intel installed and started using two High-NA EUV lithography tools from ASML at its D1 development fab near Hillsboro, Oregon, last year and has now processed as many as 30,000 w ...

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Intel announced that its new ASML lithography machines are now in production, after a 7-year delay, to produce smaller and faster chips by 2024.

During the last quarter, Intel kept up a steady pace with the manufacture of 30,000 wafers.ts most recent high-NA EUV machines nearly match the performance of earlier EUV systems, yet they deliver ...

In a blistering critique, former Intel CEO and Chairman Craig Barrett has strongly opposed breaking the company into separate ...

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These will likely need ASML's latest EUV tools called high numerical aperture (high NA) EUV. Intel is the only foundry that has one of these tools up and running and performing high NA R&D.

The move was a shift in strategy for Intel, which lagged rivals in adopting the previous generation of extreme ultraviolet (EUV) lithography machines. It took Intel seven years to put those ...

By way of example, TSMC's N3E node as used in the latest Apple chips has gate pitch of at minimum 45 nm and a metal pitch of ...

Intel has started using two leading-edge ASML High-NA Twinscan EXE:5000 EUV lithography tools, the company revealed on Monday at an industry conference, Reuters reports. The company uses these ...