Critically, the removal of photoresist is a nonlinear function of the applied UV energy dose. We have shown that this nonlinearity can be exploited to break the diffraction limit on feature size in ...

Non-Chemically Amplified ArF Dry Photoresists 4) By g- and i-line: g-line Photoresists, i-line Photoresists, Negative Photoresists For g- and i-line The Leading Region in the Photoresist ...

High-purity photoresists are essential for making chips on advanced production nodes. As China strides to build a self-sufficient semiconductor industry, it has to develop not only sophisticated ...