The LLNL-led initiative will evaluate the Big Aperture Thulium (BAT) laser technology to enhance EUV source efficiency by approximately tenfold compared to the current industry-standard CO2 lasers.

Demand for AI chips is growing exponentially, but costs and complexity limit the technology to a handful of companies. That ...

Silicon chip manufacturers trying to keep up with Moore's law are most likely breathing a sigh of relief that the US firm Cymer has recently delivered an extreme ultraviolet (EUV) light source to ...

The integration of a coherent EUV source employing a high-harmonic laser system and EUV scattero-metric microscopy has enabled the construction of a practical system for CD measurement and the ...

First, because EUV light is absorbed by air (in contrast with 193 nm light), the entire optical system, from source to wafer, must be enclosed in a near-vacuum environment. Second, because EUV ...