最后，对于中芯国际面临的技术瓶颈，王国辉承认，中国目前确实无法获得ASML的EUV光刻机，而这些设备是在尖端节点上生产芯片所需的。 然而 ...

Lam Research Corporation (Nasdaq: LRCX) today announced that Aether®, its innovative dry photoresist technology, has been ...

快科技1月6日消息，美国劳伦斯利弗莫尔国家实验室（LLNL）正在研究一种效率比传统CO2 EUV激光器高10倍的激光器，这将为下一代EUV光刻技术发展奠定 ...

NIL 系统提供的优势可能会挑战价值 1.5 亿美元的机器，这些机器在当今先进的芯片制造中占据主导地位，即极紫外 （EUV） 光刻扫描仪。如果佳能是 ...

Rapidus plans to install as many as 10 EUV lithography tools into its upcoming fabs in Japan, reports TrendForce, citing ...

To do so, Intel has been experimenting for quite a while when it first obtained ASML's Twinscan EXE:5000, which was the industry's first EUV scanner with a 0.55 numerical aperture. Today ...

This is because all matter, including air, absorbs EUV radiation. For scanner manufacturers, this has two major consequences. First, it means that all the optical elements responsible for the ...

Current EUV pellicles struggle to withstand the extreme conditions of high-power EUV scanners, leading to performance issues. The potential of carbon nanotubes: CNT-based EUV pellicles offer ...

Current Low-NA EUV scanners require up to 1,170 kW, and next-gen High-NA tools are projected to need as much as 1,400 kW per unit (according to TechInsights). The number of these machines ...

Kasprowicz: In EUV, you have reflective optics. If you expose light perpendicular to a mirror, it’s going to come right back into the optical column of the EUV scanner, and it’s not going to hit the ...