EUV lithography tools consume such vast amounts of power because they rely on high-energy laser pulses to evaporate tiny tin droplets (at 500,000ºC) to form a plasma that emits 13.5-nanometer light.

ASML’s strong moat is challenged by potential competitors and geopolitical risks. Read why ASML stock’s premium valuation may ...

2023年9月，许多人为“光刻厂”的构想喜大普奔。据说中国可以另辟蹊径，不是用一台台的光刻机，而是用加速器做一个巨大的光源，可以供28 nm、14 nm、7 nm、5 ...

Hertz et al. 4 have developed a soft-X-ray/EUV microscope in the water window that achieves sub-visible-light resolution. The microscope consists of a laser-plasma source and zone-plate optics to ...

For years, Dutch company ASML has maintained a global monopoly on EUV machines using the laser-produced plasma (LPP) method. However, since 2019, US-led sanctions have barred ASML from selling ...

This uses a CO 2 laser of wavelength 10.6 μm to convert tin droplets into a plasma, which then emits bursts of broadband EUV radiation. According to Cymer, this set-up has twice the conversion ...

Efforts involve the use of solar hard and soft X-ray, microwave, optical, and extreme ultra-violet (EUV) data.