First, because EUV light is absorbed by air (in contrast with 193 nm light), the entire optical system, from source to wafer, must be enclosed in a near-vacuum environment. Second, because EUV ...
来自MSN2 个月
American lab is developing a BAT laser that could enable 'beyond EUV' lithography, provide ...Generating and manipulating tin droplets also requires power. In addition, vacuum requirements to prevent the absorption of EUV light by air add to the overall energy use. Finally, as advanced ...
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