GM is developing a new generation for the all-electric Chevy Bolt EV. Now, it looks as though an early next-gen Bolt EV prototype has been spotted in the wild.

9月，佳能交付了一种技术的首个商业版本，该技术有朝一日可能颠覆最先进硅芯片的制造方式。这种技术被称为纳米压印光刻技术（NIL，nanoimprint lithography），它能够绘制出小至14纳米的电路特征——使逻辑芯片达到与英特尔、超微半导体（AMD）和英伟达现正 ...

最后，对于中芯国际面临的技术瓶颈，王国辉承认，中国目前确实无法获得 ASML 的 EUV 光刻机，而这些设备是在尖端节点上生产芯片所需的。然而 ...

EUV光刻机的波长为13.5nm，而100KeV电子束的波长只有0.004nm，波长短使其在分辨率方面与EUV相比有绝对的优势，也使得电子束能够实现EUV光刻都实现不了 ...

A breakthrough in EUV light generation has come from adopting the laser-induced discharge plasma (LDP) method, an innovative approach that avoids reliance on LPP technology. The LDP process ...

A breakthrough introduced by Lam in 2020, dry resist extends the resolution, productivity, and yield of Extreme Ultraviolet (EUV) lithography, a pivotal technology used in the production of ...

A pilot line will begin at Rapidus’ IIM-1 in April 2025. A single-wafer process will be introduced for all manufacturing ...

and yield of Extreme Ultraviolet (EUV) lithography, a pivotal technology used in the production of next-generation semiconductor devices. Lam's dry resist approach overcomes the biggest challenges ...

ASML will deliver the first high-NA-EUV chip production machine for mass production in the coming months. This slightly ...

The strong results were largely driven by additional system upgrades and the recognition of revenue from two High-NA EUV systems, a next-generation lithography technology essential for advanced ...